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dc.contributor.authorStorebø, Asta Katrine
dc.contributor.authorGoldar, Dara
dc.contributor.authorBrudevoll, Trond
dc.date.accessioned2017-09-28T08:04:04Z
dc.date.accessioned2017-09-29T07:56:09Z
dc.date.available2017-09-28T08:04:04Z
dc.date.available2017-09-29T07:56:09Z
dc.date.issued2017
dc.identifier.citationStorebø AK, Goldar, Brudevoll T. Simulation of infrared avalanche photodiodes from first principles. Proceedings of SPIE, the International Society for Optical Engineering. 2017;10177en_GB
dc.identifier.urihttp://hdl.handle.net/20.500.12242/643
dc.identifier.urihttps://ffi-publikasjoner.archive.knowledgearc.net/handle/20.500.12242/643
dc.descriptionStorebø, Asta Katrine; Goldar, Dara; Brudevoll, Trond. Simulation of infrared avalanche photodiodes from first principles. Proceedings of SPIE, the International Society for Optical Engineering 2017 ;Volum 10177.en_GB
dc.description.abstractThe present article deals with device physics and modeling of an Hg0.28Cd0.72Te wide-area electron-initiated avalanche photodiode, with main input data extracted from first principles electronic structure codes. Due to the large dimensions of 30 μm x 30 μm x 11 μm a method which combines Monte Carlo transport simulation in the active multiplication layer with ‘weak conduction’ modeling in the charge carrier exit paths is introduced. Consequences resulting from adding perturbative, non-self-consistent small-signal analyses upon a self-consistent, large-signal background bias simulation are briefly examined. Likewise, the issue of ambipolar versus independent electron-hole transport in the absorption layer is discussed. We investigate the effects of alloy scattering on avalanche gain and compare alloy scattering rates used in some recent studies. Alloy scattering is for this particular device and model shown to increase the gain by more than an order of magnitude at typical bias voltages.en_GB
dc.language.isoenen_GB
dc.titleSimulation of infrared avalanche photodiodes from first principlesen_GB
dc.typeArticleen_GB
dc.date.updated2017-09-28T08:04:04Z
dc.identifier.cristinID1495365
dc.identifier.cristinID1495365
dc.identifier.doi10.1117/12.2262473
dc.source.issn0277-786X
dc.source.issn1996-756X
dc.type.documentJournal article
dc.relation.journalProceedings of SPIE, the International Society for Optical Engineering


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